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Influence of Gate Dielectric and Channel Scaling on the Low-Frequency Noise Characteristics of InGaZnO Field-Effect Transistors
Category : International Journal Editor : 황도경 Published Date : 2026.02 Publications : ACS Applied Electronic Materials
Influence of Gate Dielectric and Channel Scaling on the Low-Frequency Noise Characteristics of InGaZnO Field-Effect Transistors
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